Method for monitoring a reticle

Details Method for monitoring a reticle Method for monitoring a reticle

2007-11-27

2007-11-27

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C430S945000, C382S144000

Reexamination Certificate

active

11394145

ABSTRACT:
Reticles may comprise shading elements (SEs) for locally altering the reticle optical properties. However, such reticles may degrade over time as a result of repeated exposure to radiation in a lithography process, as the radiation may “heal” the SEs. Disclosed are techniques for monitoring a reticle in order to maintain confidence about the reticle's optical properties and the uniformity of patterns on wafers that are to be printed using the reticle. Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography process.

REFERENCES:
patent: 6516085 (2003-02-01), Wiley et al.
patent: 6654489 (2003-11-01), Wiley et al.
patent: 7123356 (2006-10-01), Stokowski et al.
patent: 2004/0009416 (2004-01-01), Peterson et al.
patent: 2004/0091142 (2004-05-01), Peterson et al.
patent: 2005/0084767 (2005-04-01), Zait et al.
patent: 2006/0236294 (2006-10-01), Saidin et al.
patent: PCT/IL2004/000653 (2005-01-01), None

Affiliated with

Also associated with

Rating

Method for monitoring a reticle does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for monitoring a reticle, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for monitoring a reticle will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3822261