Method for microfabrication of pattern on substrate using X-ray

Details Method for microfabrication of pattern on substrate using X-ray Method for microfabrication of pattern on substrate using X-ray

1985-12-27

1988-05-24

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430966, 430967, 430331, 430270, 430296, G03C 500

Patent

active

047465964

ABSTRACT:
A method for microfabrication of a pattern on a substrate in accordance with the present invention comprises steps of; forming a thin film of X-ray sensitive resist of chlorinated polymethylstyrene on the substrate, wherein the chlorinated polymethylstyrene has an average molecular weight of 400,000-700,000 and a chlorine content of 20-40 wt. % and contains fundamental monomer structure of ##STR1## where at least one of the atom sites .alpha., .beta. and .gamma. is occupied by chlorine instead of hydrogen; selectively exposing the film to Pdl.sub..alpha. radiation; developing the exposed film with ethoxyethanol and/or methoxyethanol.

REFERENCES:
patent: 4535054 (1985-08-01), Brault et al.
patent: 4551417 (1985-11-01), Suzuki et al.
"Polychloromethylstyrene: A high performance X-ray resist", by H. S. Choong and F. J. Kahn; J. Vac. Sci. Thecnol. B. vol. 1, No. 1, No. 4, 1983, pp. 1066-1071.

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