Method for measuring thickness of films

Details Method for measuring thickness of films Method for measuring thickness of films

1999-05-28

2000-09-19

Pham, Hoa Q.

Optics: measuring and testing

By configuration comparison

With photosensitive film or plate

356382, 25055927, G01B 1100

Patent

active

061220647

ABSTRACT:
Film thickness variation is measured in a region determined to be particularly non-uniform. Preferably the region is a donut entirely disposed within 15 mm of the edge of the film. Preferably the measurements are effected by and ISTS apparatus. The method is particularly well adapted to copper films deposited by ECD.

REFERENCES:
patent: 5120966 (1992-06-01), Kondo
patent: 5546811 (1996-08-01), Rogers et al.
patent: 5555474 (1996-09-01), Ledger
patent: 5633711 (1997-05-01), Nelson
patent: 5812261 (1998-09-01), Nelson et al.
U.S. application No. 09/067,411 entitled "Method andDevice for Measuring the Thickness of Thin Films Near A Sample's Edge and in a Damascene-type Structure".

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