Method for manufacturing transparent electrode pattern and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S308000, C430S310000, C430S314000

Reexamination Certificate

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08062834

ABSTRACT:
Provided are a method for manufacturing a transparent electrode pattern and a method for manufacturing an electro-optic device having the transparent electrode pattern. The method for manufacturing the transparent electrode pattern includes forming a transparent electrode on a light-transmissive substrate, patterning the transparent electrode by removing a portion of the transparent electrode, and forming an insulating protective layer in an edge region of the patterned transparent electrode through a printing process. In accordance with the method, the insulating protective layer is formed in the edge region of the patterned transparent electrode through the printing process so that an apparatus and method for manufacturing the insulating protective layer can be simplified, resulting in a decrease in manufacturing cost.

REFERENCES:
patent: 5737049 (1998-04-01), Shin et al.
patent: 6445428 (2002-09-01), Fujikawa et al.
patent: 7968458 (2011-06-01), Chuman et al.
patent: 2008/0124522 (2008-05-01), Chuman et al.
patent: 63-097922 (1988-04-01), None
patent: 01-246877 (1989-10-01), None
patent: 1020060049490 (2006-05-01), None

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