Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2008-02-27
2011-11-08
Kelly, Cynthia (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S320000
Reexamination Certificate
active
08053179
ABSTRACT:
A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided.A method for manufacturing a substrate for making a microarray, comprising, a step of forming a resist film on the substrate using a chemically amplified positive resist composition using a copolymer where a content of a monomer unit having a hydroxyl group is 5 mole % or less relative to total monomer units as a binder; a step of patterning the resist film; a step of forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and subsequently a step of removing the resist film.
REFERENCES:
patent: 4881109 (1989-11-01), Ogawa
patent: 6517994 (2003-02-01), Watanabe
patent: 6641975 (2003-11-01), Takeda et al.
patent: 2005/0233366 (2005-10-01), Mino
patent: A 62-50657 (1987-03-01), None
patent: A 4-221630 (1992-08-01), None
patent: A-2004-294085 (2004-10-01), None
patent: A 2005-77210 (2005-03-01), None
patent: A-2005-326400 (2005-11-01), None
patent: A 2006-124314 (2006-05-01), None
patent: A 2006-225476 (2006-08-01), None
patent: WO03/087798 (2003-10-01), None
Wallraff et al., “DNA sequencing on a chip”,Chemtech, pp. 22-32, Feb. 1997.
Ishihara Toshinobu
Kinsho Takeshi
Kusaki Wataru
Kelly Cynthia
Oliff & Berridg,e PLC
Shin-Etsu Chemical Co. , Ltd.
Sullivan Caleen
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