Method for manufacturing semiconductor device and...

Details Method for manufacturing semiconductor device and... Method for manufacturing semiconductor device and...

2009-02-03

2010-12-07

Garber, Charles D (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S014000, C438S391000, C438S700000, C257SE21545, C257SE21546, C257SE21553, C257SE21564

Reexamination Certificate

active

07846792

ABSTRACT:
A method for manufacturing a semiconductor device that controls the influence of a thickness of a stopper film even if there is a change in the thickness of the stopper film by measuring the thickness prior to etching to a predetermined thickness.

REFERENCES:
patent: 6204146 (2001-03-01), Jenq
patent: 7163869 (2007-01-01), Kim et al.
patent: 2002-151465 (2002-05-01), None
patent: 2004-71862 (2004-03-01), None
patent: 2006-4982 (2006-01-01), None
patent: 2007-109966 (2007-04-01), None

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