Method for manufacturing self-compensating resistors within...

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal

Reexamination Certificate

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Details

C438S210000, C438S238000, C338S275000, C338S330000, C029S610100, C029S612000

Reexamination Certificate

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07052925

ABSTRACT:
A method for manufacturing a self-compensating resistor within an integrated circuit is disclosed. The self-compensating resistor includes a first resistor and a second resistor. The first resistor having a first resistance value is initially formed, and then the second resistor having a second resistance value is subsequently formed. The second resistor is connected in series with the first resistor. The second resistance value is less than the first resistance value, but the total resistance value of the first and second resistors lies beyond a desired target resistance range. Finally, an electric current is sent to the second resistor to change the dimension of the second resistor such that the total resistance value of the first and second resistors falls within the desired target resistance range.

REFERENCES:
patent: 5134088 (1992-07-01), Zetterlund
patent: 5422298 (1995-06-01), Jiminez
patent: 5680092 (1997-10-01), Yamada et al.
patent: 5683566 (1997-11-01), Hetzler
patent: 6507993 (2003-01-01), Dunn
patent: 6534374 (2003-03-01), Johnson et al.

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