Method for manufacturing phase gratings of a combination pattern

Details Method for manufacturing phase gratings of a combination pattern Method for manufacturing phase gratings of a combination pattern

1986-10-21

1988-10-11

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Light scattering or refractive index image formation

430325, 430330, 430285, 430287, G03C 516, G03C 500

Patent

active

047771160

ABSTRACT:
A method for manufacturing a combination pattern-refraction modification type phase grating comprises the steps of (1) forming a thin film of composition which includes a photosensitive acrylic acid or methacrylic acid group polymer including double bonds between carbons and at least one of compounds selected from aromatic aldehyde and aromatic ketone which have a substituent or a no-substituent (2) irradiating the thin film in a regularly arranged pattern with ultraviolet rays and (3) removing the non-reacted compound.

REFERENCES:
patent: 3376138 (1968-04-01), Giangualano et al.
patent: 3689264 (1972-09-01), Chandross et al.
patent: 3993485 (1976-11-01), Chandross et al.
patent: 4001016 (1977-01-01), Rosenkranz et al.
patent: 4187111 (1980-02-01), Chandross et al.

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