Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1997-07-07
1999-11-23
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
118 501, 118695, 118723E, 118723VE, 20419226, 427162, 4272551, 4272553, 427294, 427569, 427576, 427580, H05H 124
Patent
active
059896540
ABSTRACT:
A method for manufacturing an optical information recording medium which is usually stable and is not affected by the environmental condition and an apparatus used therefor. The method comprises the steps of placing a substrate and a member comprising a material for a film opposing each other in a vacuum film forming chamber; forming a plasma by glow discharging a gas between the substrate and the member comprising a material for a film; and supplying a gas mixture containing water to the film forming chamber before forming films or during forming films of the protective layer by the film forming method in which the material for a film freed from the member comprising a material for a film by using the plasma as an energy source are attached or deposited on the substrate.
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Akira Kinbara, "Basic Technology of Thin Film", pp. 53-56. (English Translation) (No date avail.).
Isomura Hidemi
Ohno Eiji
Ohta Hiroyuki
Yoshioka Kazumi
Matsushita Electric - Industrial Co., Ltd.
Pianalto Bernard
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