Method for manufacturing an optical information recording medium

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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118 501, 118695, 118723E, 118723VE, 20419226, 427162, 4272551, 4272553, 427294, 427569, 427576, 427580, H05H 124

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059896540

ABSTRACT:
A method for manufacturing an optical information recording medium which is usually stable and is not affected by the environmental condition and an apparatus used therefor. The method comprises the steps of placing a substrate and a member comprising a material for a film opposing each other in a vacuum film forming chamber; forming a plasma by glow discharging a gas between the substrate and the member comprising a material for a film; and supplying a gas mixture containing water to the film forming chamber before forming films or during forming films of the protective layer by the film forming method in which the material for a film freed from the member comprising a material for a film by using the plasma as an energy source are attached or deposited on the substrate.

REFERENCES:
patent: 4337768 (1982-07-01), Hatada et al.
patent: 5013594 (1991-05-01), Mizumura et al.
patent: 5020048 (1991-05-01), Arai et al.
patent: 5468560 (1995-11-01), McPherson et al.
patent: 5586110 (1996-12-01), Nakaki
patent: 5609290 (1997-03-01), Bobbio et al.
Akira Kinbara, "Basic Technology of Thin Film", pp. 53-56. (English Translation) (No date avail.).

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