Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-08-24
1995-04-04
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429816, 29603, 360126, C23C 1435, G11B 5127
Patent
active
054034574
ABSTRACT:
The method of the invention provides a soft magnetic film having a high saturation magnetic flux density and an anisotropy of high magnetic permeability suitable for use in various types of magnetic heads at a high production yield by use of a sputtering apparatus provided with a sputtering electrode, which has permanent magnets arranged above a target 1 mainly of Fe or Co in such a way that lines of magnetic force 3 generated by said permanent magnets are in parallel to the surface of said target 1 and to the center line of said target 1 and have a magnetic strength pattern symmetric with respect to said center line while the lines of magnetic force to the right of said center line are of a reverse direction to those to the left of said center line.
REFERENCES:
patent: 4865709 (1989-09-01), Nakagawa et al.
patent: 5026470 (1991-06-01), Bonyhard et al.
patent: 5045166 (1991-09-01), Bobbio
patent: 5176806 (1993-01-01), Hasegawa
J. Appl. Phys. 65(3), Feb. 1, 1989, Senda et al., "Magnetic Properties of Fe/SiO.sub.2 Multilayer Film," pp. 1238-1242.
IEEE Translation Journal on Magnetics, vol. 6, No. 1, Jan. 1991 "Effects of Addition of Zr and Ti on Sputtered Fe-N Films," Terunuma et al., pp. 23-28.
Aokura Isamu
Nago Kumio
Osano Koichi
Sakakima Hiroshi
Suemitsu Toshiyuki
Matsushita Electric - Industrial Co., Ltd.
Weisstuch Aaron
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