Method for making electron sensitive negative resist

Details Method for making electron sensitive negative resist Method for making electron sensitive negative resist

1980-07-09

1982-02-09

Henderson, C. A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

20415916, 427 431, 427 44, 427 93, 427 96, 430311, 430312, 430315, 430910, 430942, 526256, G03C 171

Patent

active

043150675

ABSTRACT:
A polymerized resin capable, upon electronic irradiation, of undergoing a cross-linking completing the polymerization and rendering it insoluble in certain solvents. Such a negative resin is ten times more sensitive to electrons than the best known resin. It is obtained by copolymerization of an epithiopropylmethacrylate: ##STR1## and of a vinyl monomer such as methyl methacrylate.

REFERENCES:
patent: 3364184 (1968-01-01), Krukziener
patent: 3404158 (1968-10-01), Yu
patent: 4130424 (1978-12-01), Feit

Affiliated with

Also associated with

Rating

Method for making electron sensitive negative resist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for making electron sensitive negative resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for making electron sensitive negative resist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1261035