Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1994-02-14
1994-11-08
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430176, 430270, 430330, G03F 730, G03F 738, G03F 740
Patent
active
053626079
ABSTRACT:
A method for preparing a positive photoresist substrate composite is provided which can be used in the presence or absence of atmospheric moisture. There is used a major amount of a commercially available resin, such as a novolak, a dissolution inhibitor with thermally labile t-butyl ether or ester groups, and an aryl onium salt.
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Crivello James V.
Lee Julia L.
O'Brien Michael J.
Bowers Jr. Charles L.
Chu John S.
MicroSi, Inc.
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