Method for making a mirror for photolithography

Details Method for making a mirror for photolithography Method for making a mirror for photolithography

2005-04-26

2005-04-26

Norton, Nadine G. (Department: 1765)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S089000, C216S090000, C216S097000, C216S099000, C216S100000

Reexamination Certificate

active

06884361

ABSTRACT:
A method for making a substrate for a mirror used in photolithography is described. That method comprises forming a crystalline layer on a first layer, which has a low coefficient of thermal expansion. Part of the crystalline layer is then removed to form on the first layer a second layer that has a high quality surface finish.

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patent: 6159824 (2000-12-01), Henley et al.
patent: 6368942 (2002-04-01), Cardinale

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