Method for making a merged contact window in a transistor to...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C438S301000, C438S586000, C438S595000, C438S620000, C438S675000, C438S687000

Reexamination Certificate

active

06426263

ABSTRACT:

FIELD OF THE INVENTION
This invention relates to integrated circuits and methods of fabricating integrated circuits.
BACKGROUND OF THE INVENTION
The manufacture of circuits on semiconductor wafers begins with “front end”, which is the creation of circuit elements and devices like field effect transistors (FETs) and capacitors. These devices are covered by a dielectric layer and then “windows” are opened in the dielectric layer over the device contacts and extend all the way through the dielectric. The windows are filled with an electrical conductor material to create an electrically conductive via that brings the device contacts, such as to the source, gate and drain of an FET, to the surface of the dielectric. There, the vias are connected to each other at the top of the dielectric layer to connect the devices into various circuit patterns. The levels (there are usually more than one) where the interconnection of the devices occur are known as the back end. It is desirable that as many device connections be made at the front end as possible. By doing this, the number of interconnect levels required can be reduced, the area occupied by a circuit reduced, signal transit time is shortened, leakage is reduced and general circuit performance and yield is increased.
SUMMARY OF THE INVENTION
The invention includes a method for manufacturing a merged contact in a window, comprising opening a window to one of a source and a drain of a field effect transistor and to and only partially overlapping a gate electrode of the field effect transistor, and depositing an electrical conductor connecting the gate electrode with one of the source and the drain to provide a merged contact between the gate and one of the source and the drain. Also described are integrated circuit devices made thereby, such as a field effect transistor comprising a source, a gate, a gate electrode and a drain, the field effect transistor having a merged contact electrically connecting a gate electrode of the field effect transistor and one of the drain and the source of the field effect transistor.


REFERENCES:
patent: 4821089 (1989-04-01), Strauss
patent: 5795820 (1998-08-01), Kepler
patent: 5895269 (1999-04-01), Wang et al.
patent: 5899742 (1999-05-01), Sun
patent: 5940735 (1999-08-01), Mehta et al.
patent: 5990524 (1999-11-01), En et al.
patent: 6083827 (2000-07-01), Lin et al.
patent: 6258679 (2001-07-01), Burns et al.
patent: 6287953 (2001-09-01), Sander et al.
patent: 6306741 (2001-10-01), Lee et al.
“Borderless Contacts Trimmed by Embedded Line Conductor in an Organic Insulator,” IBM Technical Disclosure Bulletin, vol. 32, No. 12, pp. 142-143, May 1990.*
F. White et al., “Damascene Stud Local Interconnect in CMOS Technology,” IEEE Technical Digest of the 1992 International Electron Devices Meeting, pp. 301-304, Dec. 1992.

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