Method for inspection of periodic grating structures on...

Optics: measuring and testing – By alignment in lateral direction

Reexamination Certificate

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Reexamination Certificate

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10735414

ABSTRACT:
The invention relates to a method for inspection of periodic structures on lithography masks using a microscope with adjustable illumination and an operating element for movement of a mechanical stage with the lithography mask attached to it in order to record images of the lithography mask at a computer-controlled location on the lithography mask. The position, the size and the pitch specification of the lithography mask are stored.

REFERENCES:
patent: 3658420 (1972-04-01), Axelrod
patent: 3972616 (1976-08-01), Minami et al.
patent: 4595289 (1986-06-01), Feldman et al.
patent: 5838433 (1998-11-01), Hagiwara
patent: 5905572 (1999-05-01), Li
patent: 6268093 (2001-07-01), Kenan et al.
patent: 6630996 (2003-10-01), Rao et al.
patent: 6879391 (2005-04-01), Danko
patent: 2004/0086167 (2004-05-01), Jun et al.

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