Optics: measuring and testing – By alignment in lateral direction
Reexamination Certificate
2007-08-28
2007-08-28
Chowdury, Tarifur R. (Department: 2886)
Optics: measuring and testing
By alignment in lateral direction
Reexamination Certificate
active
10735414
ABSTRACT:
The invention relates to a method for inspection of periodic structures on lithography masks using a microscope with adjustable illumination and an operating element for movement of a mechanical stage with the lithography mask attached to it in order to record images of the lithography mask at a computer-controlled location on the lithography mask. The position, the size and the pitch specification of the lithography mask are stored.
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Dettmann Wolfgang
Koehle Roderick
Verbeek Martin
Akanbi Isiaka O.
Chowdury Tarifur R.
Infineon - Technologies AG
Slater & Matsil L.L.P.
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