Method for improving heat transfer of a focus ring to a...

Details Method for improving heat transfer of a focus ring to a... Method for improving heat transfer of a focus ring to a...

2008-01-08

2010-02-02

Garber, Charles D (Department: 2812)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

Ionized irradiation

C156S345470, C156S345520, C156S345530, C257SE21001

Reexamination Certificate

active

07655579

ABSTRACT:
A focus ring heat transfer method improves heat transfer of a focus ring arranged in an outer peripheral portion of a mounting surface of a mounting table adapted to mount a target substrate in a chamber. The method includes steps of: disposing a heat transfer sheet between the focus ring and the mounting table; and vacuum-evacuating the chamber prior to processing the target substrate and then restoring the pressure the inside of the chamber to an atmospheric pressure or a light vacuum pressure. Therefore, air present in a fine gap between the heat transfer sheet and the mounting surface is removed to allow the heat transfer sheet to adhere to the mounting surface.

REFERENCES:
patent: 5255445 (1993-10-01), Li et al.
patent: 5683744 (1997-11-01), Jolly et al.
patent: 5978202 (1999-11-01), Wadensweiler et al.
patent: 6723202 (2004-04-01), Nagaiwa et al.
patent: 6733624 (2004-05-01), Koshiishi et al.

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