Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1983-08-09
1984-10-09
Downey, Mary F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
427 431, 430311, 430313, 430326, G03C 500
Patent
active
044762160
ABSTRACT:
A method for performing high resolution lithography. The first step involves disposing on a substructure having a surface layer to be patterned a layer of a resist material characterized by both substantial degradation sensitivity for incident ionizing radiation of a predetermined type and substantial instability of undegraded regions for a predetermined plasma etchant which attacks the surface layer. The next step is to expose a prearranged pattern of regions of the resist layer to the predetermined type of radiation to produce a corresponding pattern of degraded resist regions. Then the pattern of degraded resist regions is removed using a preselected developing solution. The next step is to modify the resist material to increase the stability thereof for the plasma etchant by exposing the developed resist layer to ionizing radiation of a type which has been predetermined to degrade the resist material and then baking the degraded resist layer. The final step is to etch the exposed regions of the surface layer using said plasma etchant.
REFERENCES:
patent: 4093461 (1978-06-01), Loprest et al.
patent: 4278754 (1981-07-01), Yamashita et al.
patent: 4289845 (1981-09-01), Bowden et al.
Amdahl Corporation
Downey Mary F.
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