Method for forming resist pattern

Details Method for forming resist pattern Method for forming resist pattern

2005-02-22

2005-02-22

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S311000, C430S327000, C430S330000, C430S942000, C430S945000

Reexamination Certificate

active

06858375

ABSTRACT:
A method for forming a resist pattern comprising the steps of: forming a light-shield film on an overall surface of a transparent substrate; forming a resist layer and an organic film being capable of functioning as a trap layer or an electron beam buffer layer against electrons on an overall surface of the light-shield film in this order; carrying out exposure in a desired pattern above the organic film; and developing the resist layer and the organic film to form a desired pattern in the resist layer.

REFERENCES:
patent: 5985516 (1999-11-01), Shy
patent: 6482558 (2002-11-01), Singh et al.
patent: 05-217875 (1993-08-01), None
patent: 06-061132 (1994-03-01), None

Affiliated with

Also associated with

Rating

Method for forming resist pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming resist pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming resist pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3504666