Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1994-04-20
1995-03-28
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430165, 430275, G03F 730, G03F 7023
Patent
active
054016177
ABSTRACT:
Proposed is an alkali-soluble, positive-working photosensitive resin composition which can be used as a material for forming a finely patterned resist layer on the surface of a metallic substrate such as tantalum to exhibit excellent adhesion of the patterned resist layer to the substrate surface. The composition comprises, in addition to a novolac resin as a film-forming agent and a naphthoquinone diazide group-containing compound as a photosensitizer, an aromatic compound having two benzene rings and at least five phenolic hydroxy groups in a molecule such as pentahydroxy and hexahydroxy benzophenone compounds as an adhesion improver.
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Kato Tetsuya
Kohara Hidekatsu
Nakayama Toshimasa
Takahashi Kouichi
Bowers Jr. Charles L.
Burke Henry T.
Tokyo Ohka Kogyo Co. Ltd.
Young Christopher G.
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