Method for forming photoresist pattern

Details Method for forming photoresist pattern Method for forming photoresist pattern

1998-08-10

2000-10-17

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

4302711, 4302731, G03C 500

Patent

active

061329398

ABSTRACT:
A method for forming a resist pattern comprising the steps of: exposing a chemically amplified resist film by use of a mask having a given pattern; forming a protective film made of a paraffin having a melting point of not higher than 10.degree. C. and a boiling point of not lower than 50.degree. C. on the surface of the chemically amplified resist film before or after exposing the chemically amplified resist film; and forming the given pattern in the chemically amplified resist film by developing.

REFERENCES:
patent: 4977036 (1990-12-01), Baldi
patent: 5707784 (1998-01-01), Oikawa et al.
patent: 5962196 (1999-10-01), Das et al.

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