Method for forming pattern using photomask

Details Method for forming pattern using photomask Method for forming pattern using photomask

2006-12-05

2006-12-05

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S005000, C430S322000, C430S396000

Reexamination Certificate

active

07144684

ABSTRACT:
A photomask includes a semi-light-shielding portion having a light-shielding property, a light-transmitting portion surrounded by the semi-light-shielding portion and a peripheral portion positioned in a periphery of the light-transmitting portion on a transparent substrate. The semi-light-shielding portion and the light-transmitting portion transmit the exposure light in the same phase each other, whereas the peripheral portion transmits the exposure light in a phase opposite to that of the light-transmitting portion. A phase shift film that transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in the semi-light-shielding portion formation region.

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patent: 7001694 (2006-02-01), Misaka
patent: 08-227142 (1996-09-01), None
patent: 09-090601 (1997-04-01), None
patent: 10-048806 (1998-02-01), None
patent: 2000-019710 (2000-01-01), None

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