Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1996-03-13
1998-06-23
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430313, 430314, 430316, 430317, 430323, 430394, 216 41, G03C 500
Patent
active
057703507
ABSTRACT:
A method for forming a pattern using a multilayer resist including the steps of: coating a first lower resist layer on a substrate having a lower level region and an upper level region; selectively subjecting the upper level region to an over exposure using a mask; subjecting the first lower resist layer to a development process; coating a second lower resist layer on the first lower resist layer and the upper level region; forming an intermediate layer on the second lower resist layer; coating an upper resist layer on the intermediate layer; patterning the upper resist layer to form a predetermined upper resist pattern; transferring the upper resist pattern to the intermediate layer to form an intermediate pattern; and transferring the intermediate pattern to the first and second lower resist layers.
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Codd Bernard P.
Lesmes George F.
LG Semicon Co. Ltd.
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