Method for forming pattern, and optical element

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Light scattering or refractive index image formation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S322000, C430S324000

Reexamination Certificate

active

07378224

ABSTRACT:
There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding oil-shedding region by use of a radiation sensitive resin composition and coating the pattern with a high refractive index resin solution using a solvent having low wettability to the water-shedding oil-shedding region so as to form two regions of different refractive indices.

REFERENCES:
patent: 2004/0080264 (2004-04-01), Ichikawa
patent: 1 296 186 (2003-03-01), None
patent: 1 323 742 (2003-07-01), None
patent: 62-25705 (1987-02-01), None
patent: 7-92313 (1995-04-01), None
patent: 11-60803 (1999-03-01), None
patent: 2002-164180 (2002-06-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming pattern, and optical element does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming pattern, and optical element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming pattern, and optical element will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2774424

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.