Method for forming pattern

Details Method for forming pattern Method for forming pattern

1991-01-28

1993-10-12

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430322, 430330, G03F 720, G03F 740, G03C 516

Patent

active

052524353

ABSTRACT:
A pattern with high contrast and good adhesive-ness to a substrate can be formed by forming on a substrate a film of pattern forming material comprising (a) a resin having functional groups and hydrophilic groups, (b) a photoacid generator, and (c) a solvent, exposing the film selectively to light, heating the exposed film and developing the resulting film.

REFERENCES:
patent: 4537854 (1985-08-01), Crivello
patent: 4610952 (1986-09-01), Crivello
patent: 4883740 (1989-11-01), Schwalm
patent: 5017461 (1991-05-01), Abe
patent: 5035979 (1991-07-01), Nguyen-Kim
patent: 5055439 (1991-10-01), Allen

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