Method for forming micropattern

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Including heating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S270100, C430S273100, C430S311000, C430S325000

Reexamination Certificate

active

07579138

ABSTRACT:
The present invention provides a method for forming a micropattern, enabling to narrow intervals between resist patterns, in which the narrowing extent of intervals between resist patterns can be increased while maintaining the controllability of resist pattern dimensions and the good resist pattern shape within a wafer face. The present invention relates a method for forming a micropattern comprising: a coating film formation process for applying a coating composition to form a coating film on a substrate having a resist pattern; a first heating treatment process for heat-treating the coating film; a coating film removal process for removing the coating film after the first heating treatment process; and a second heat treatment process for heat-treating the pattern narrowed after the coating film removal process.

REFERENCES:
patent: 3895949 (1975-07-01), Akamatsu et al.
patent: 5750312 (1998-05-01), Chandross et al.
patent: 6033134 (2000-03-01), Maruyama et al.
patent: 6451510 (2002-09-01), Messick et al.
patent: 6566040 (2003-05-01), Sugino et al.
patent: 6811817 (2004-11-01), Sugeta et al.
patent: 2003/0096903 (2003-05-01), Sugeta et al.
patent: 2004/0137377 (2004-07-01), Shinbori et al.
patent: 2005/0245663 (2005-11-01), Sugeta et al.
patent: 1-307228 (1989-12-01), None
patent: 4-364021 (1992-12-01), None
patent: 5-166717 (1993-07-01), None
patent: 5-241348 (1993-09-01), None
patent: 2003-107752 (2003-04-01), None
patent: 2003-142381 (2003-05-01), None
patent: 2005-316239 (2005-11-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming micropattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming micropattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming micropattern will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4056438

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.