Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Including heating
Reexamination Certificate
2007-07-19
2009-08-25
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Including heating
C430S270100, C430S273100, C430S311000, C430S325000
Reexamination Certificate
active
07579138
ABSTRACT:
The present invention provides a method for forming a micropattern, enabling to narrow intervals between resist patterns, in which the narrowing extent of intervals between resist patterns can be increased while maintaining the controllability of resist pattern dimensions and the good resist pattern shape within a wafer face. The present invention relates a method for forming a micropattern comprising: a coating film formation process for applying a coating composition to form a coating film on a substrate having a resist pattern; a first heating treatment process for heat-treating the coating film; a coating film removal process for removing the coating film after the first heating treatment process; and a second heat treatment process for heat-treating the pattern narrowed after the coating film removal process.
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Sugeta Yoshiki
Ueno Naohisa
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
Walke Amanda C.
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