Method for forming metal pattern and method for forming gate...

Details Method for forming metal pattern and method for forming gate... Method for forming metal pattern and method for forming gate...

2007-06-29

2009-08-11

Estrada, Michelle (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S197000, C438S272000, C438S589000, C257SE29201, C257SE29257, C257SE29260

Reexamination Certificate

active

07572704

ABSTRACT:
A method for forming a metal pattern in a semiconductor device includes forming an etch stop layer over a semi-finished substrate including a metal layer, forming a hard mask over the etch stop layer, etching the hard mask to form a hard mask pattern exposing the etch stop layer, and etching the etch stop layer and the metal layer using the hard mask pattern.

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