Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2008-03-04
2008-03-04
Santiago, Mariceli (Department: 2879)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C977S700000, C430S312000, C430S321000
Reexamination Certificate
active
10844377
ABSTRACT:
Disclosed herein are a method for forming a highly electrically conductive metal pattern and an electromagnetic interference filter (EMI filter) using a metal pattern formed by the method. The method comprises the steps of (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, (ii) selectively exposing the photocatalytic film to light to form a latent pattern acting as a nucleus for crystal growth, and (iii) plating the latent pattern to grow metal crystals thereon. The EMI filter comprises the metal pattern. According to the method, a highly electrically conductive metal wiring pattern can be rapidly and efficiently formed, when compared to conventional methods. In addition, the EMI filter comprising the metal pattern not only exhibits excellent performance, but also is advantageous in terms of low manufacturing costs and simple manufacture processes. Accordingly, the EMI filter can be broadly applied to flat panel display devices, such as plasma display panels (PDPs).
REFERENCES:
patent: 7067237 (2006-06-01), Kim et al.
patent: 2002/0195916 (2002-12-01), Marutsuka
patent: 01-278800 (1989-11-01), None
patent: 05-16281 (1993-01-01), None
patent: 10-72676 (1998-03-01), None
patent: 2000-323890 (2000-11-01), None
patent: 2001-168574 (2001-06-01), None
patent: 2001291721 (2001-10-01), None
Kim Jin Young
No Chang Ho
Buchanan & Ingersoll & Rooney PC
Hines Anne M
Samsung Electronics Co,. Ltd.
Santiago Mariceli
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