Method for forming metal line and method for manufacturing...

Electric lamp or space discharge component or device manufacturi – Process – With assembly or disassembly

Reexamination Certificate

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C445S023000, C445S025000, C445S001000, C313S495000, C313S497000, C313S483000

Reexamination Certificate

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07833075

ABSTRACT:
In a method for forming a metal line, a first metal layer and a second metal layer are deposited on a substrate. The first metal layer includes aluminum, and the second metal layer includes molybdenum. A photoresist pattern having a line-shape is formed on the second metal layer. The second metal layer is etched with a chlorine-containing etching gas using the photoresist pattern as a mask. The first metal layer is then etched with a mixture of a chlorine-containing gas and nitrogen gas and/or a mixture of a chlorine-containing gas and argon gas as an etching gas. Impurities such as chlorine ions are removed from the base substrate after etching the first metal layer with a fluorine-containing gas, hydrogen gas, or water vapor. A method for manufacturing a display substrate is disclosed using the method for forming a metal line to form source, drain, and gate electrodes and gate lines.

REFERENCES:
patent: 6258723 (2001-07-01), Takeichi et al.
patent: 6383942 (2002-05-01), Narita et al.
patent: 7226867 (2007-06-01), Son et al.
patent: 7235810 (2007-06-01), Yamazaki et al.
patent: 2008/0087633 (2008-04-01), Oh et al.
patent: 2002-072230 (2002-03-01), None
patent: 10-2004-0017158 (2004-02-01), None

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