Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1987-09-21
1989-03-28
Dees, Jose G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430270, 430325, 430330, 430914, G03C 500, G03C 516
Patent
active
048163830
ABSTRACT:
A method for forming a pattern of conjugated system polymer which can be given an electrical conductivity by doping treatment which comprises forming a thin film of a polymeric sulfonium salt having a recurring unit represented by the following general formula: ##STR1## wherein R.sub.1 represents a group capable of conjugating with an adjacent vinylene group formed by elimination of sulfonium salt as a side chain, R.sub.2 and R.sub.3 each represents hydrocarbon group having 1 to 20 carbon atoms, and X.sup.- represents counter ion, on a substrate, irradiating said thin film with a prescribed pattern of light including a deep ultraviolet ray having a wavelength not longer than 300 nm and then subjecting the thin film to development.
REFERENCES:
patent: 4339526 (1982-07-01), Baise et al.
patent: 4528118 (1985-07-01), Murase et al.
Chemical Abstracts, 104(b), 44406g (Abstract of JP-A-60-165,786).
Taguchi Satoshi
Tanaka Toshihiko
Dees Jos,e G.
Sumitomo Chemical Company Limited
LandOfFree
Method for forming fine patterns of conjugated polymers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming fine patterns of conjugated polymers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming fine patterns of conjugated polymers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1658837