Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1997-10-29
1999-12-28
Gibson, Sharon
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430313, 430316, H01L 2102, G03C 500
Patent
active
060079681
ABSTRACT:
The preferred embodiment of the present invention overcomes the limitations of the prior art by providing a method to form unlinked features using hybrid resist. The method uses a trim process in order to trim the linking features from the "loops" formed by the hybrid resist. This allows the method to form a plurality of unlinked features rather than the loops. In order to trim the ends, a relatively larger trim area is formed adjacent the narrow feature line, either by a second exposure step or by utilizing a grey scale reticle. The broader or wider open area allows features to be formed in the narrow feature lines and being trimmed from the relatively large areas, thereby resulting in district features rather than loops.
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Ito, H. and Maekawa, Y., IBM Technical Disclosure Bulletin, vol. 36, No. 8, pp. 335-336, Aug. 1993.
Furukawa Toshiharu
Hakey Mark C.
Holmes Steven J.
Horak David V.
Rabidoux Paul A.
Chadurjian Mark F.
Gibson Sharon
Holloman Jill N.
International Business Machines - Corporation
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