Method for forming electrodes on mesa structures of a semiconduc

Details Method for forming electrodes on mesa structures of a semiconduc Method for forming electrodes on mesa structures of a semiconduc

1995-10-04

1997-04-08

Niebling, John

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438702, 438666, 438742, 438975, H01L 2128

Patent

active

056187530

ABSTRACT:
A method for forming an electrode on a mesa structure of a semiconductor substrate. The method comprises the steps of: selectively forming an electrode on a predetermined area in a surface of the semiconductor substrate; and subjecting the substrate to a selective etching by use of the electrode as a mask to form a mesa structure on the substrate so that the mesa structure is self-aligned just under the electrode.

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