Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1997-08-21
1999-09-28
Chaudhuri, Olik
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
438942, 438387, H01L 27108
Patent
active
059593253
ABSTRACT:
A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.
REFERENCES:
patent: 3385702 (1968-05-01), Koehler
patent: 3423205 (1969-01-01), Skaggs et al.
patent: 3508919 (1970-04-01), Reimer
patent: 3594168 (1971-07-01), Compare
patent: 3784380 (1974-01-01), Compare
patent: 3823015 (1974-07-01), Fassett
patent: 4591547 (1986-05-01), Brownell
patent: 5308741 (1994-05-01), Kemp
patent: 5340700 (1994-08-01), Chen et al.
patent: 5432044 (1995-07-01), Shimizu
patent: 5472814 (1995-12-01), Lin
patent: 5477071 (1995-12-01), Hamamoto et al.
patent: 5519236 (1996-05-01), Ozaki
B.J. Lin, Chessboard Method to Produce Electron-Beam Projection Masks, vol. 19, No. 7, Dec. 1976.
Adair William J.
Ferguson Richard A.
Hakey Mark C.
Holmes Steven J.
Horak David V.
Chadurjian Mark F.
Chaudhuri Olik
International Business Machines - Corporation
Mao Daniel H.
LandOfFree
Method for forming cornered images on a substrate and photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming cornered images on a substrate and photomask , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming cornered images on a substrate and photomask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-706423