Method for forming anti-reflective coating

Details Method for forming anti-reflective coating Method for forming anti-reflective coating

2005-09-29

2010-11-16

Zimmer, Marc S (Department: 1796)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S270100, C430S313000, C427S387000, C427S096300, C428S447000, C528S031000, C528S041000, C528S043000

Reexamination Certificate

active

07833696

ABSTRACT:
Silsesquioxane resins useful in forming the antireflective coating having the formula (PhSiO(3-x)/2(OH)x)mHSiO(3-x)/2(OH)x)n(MeSiO(3-x)/2(OH)x)p(RSiO(3-x)/2(OH)x)qwhere Ph is a phenyl group, Me is a methyl group, R is selected from ester groups and polyether groups, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95, p has a value of 0.05 to 0.95, q has a value of 0.01 to 0.30 and m+n+p+q≈1.

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