Method for forming a thin carbon overcoat in a magnetic recordin

Details Method for forming a thin carbon overcoat in a magnetic recordin Method for forming a thin carbon overcoat in a magnetic recordin

1995-08-07

1998-02-03

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 2041922, C23C 1434

Patent

active

057140448

ABSTRACT:
A method for forming an overcoat having first and second layers in a magnetic recording medium is described. The first overcoat layer is deposited in a first sputtering chamber where the magnetic means for confining target plasma in the chamber are oriented to retain magnetic-field confinement about the target surface and to produce magnetic field lines between directly confronting portions of the confronting sputtering targets. The second overcoat layer is deposited under a nitrogen-containing atmosphere.

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patent: 5022978 (1991-06-01), Hensel et al.
patent: 5110679 (1992-05-01), Haller et al.
patent: 5174880 (1992-12-01), Bourez et al.
patent: 5244554 (1993-09-01), Yamagata et al.
patent: 5366607 (1994-11-01), Lal et al.
patent: 5453168 (1995-09-01), Nelson et al.
patent: 5556519 (1996-09-01), Teer
U.S. application No. 08/615,728, Lal et al., filed Mar. 14, 1996.

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