Method for forming a structure on a substrate and device

Details Method for forming a structure on a substrate and device Method for forming a structure on a substrate and device

2007-07-31

2010-06-15

Olsen, Allan (Department: 1792)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Multiple layers

C438S007000, C438S005000, C438S010000, C257SE21259, C257SE21268, C257SE21270, C362S052000

Reexamination Certificate

active

07737049

ABSTRACT:
In one aspect, a method of forming a structure on a substrate is disclosed. For example, the method includes forming a first mask layer and a second mask layer, modifying a material property in regions of the first and second mask layers, and forming the structure based on the modified regions.

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