Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1988-08-05
1989-10-10
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430309, 430331, G03C 524, G03C 534
Patent
active
048731773
ABSTRACT:
The pattern-wise photoresist layer formed on the surface of a substrate according to the inventive method is imparted with a greatly improved resolving power as a result of complete removal of the scum residua left after the development treatment. Namely, the positive-working photoresist layer formed on the substrate surface is exposed pattern-wise to actinic rays, developed with a developer solution which is typically a 2-7% aqueous solution of a quaternary ammonium hydroxide and then rinsed with a scum-remover solution which is a mixture of 100 parts of a 0.1-1.5% aqueous solution of a quaternary ammonium hydroxide and 1-30 parts of a water-miscible organic solvent and capable of dissolving away the scum residua in the pattern-wise photoresist layer without affecting the quality of the photoresist pattern reproduction.
REFERENCES:
patent: 4239661 (1980-12-01), Muraoka et al.
patent: 4530895 (1985-07-01), Simon et al.
patent: 4576793 (1986-03-01), Kita et al.
patent: 4617254 (1986-10-01), Kinoshita et al.
Kohara Hidekatsu
Nakayama Toshimasa
Sato Yoshiyuki
Tanaka Hatsuyuki
Doody Patrick A.
Michl Paul R.
Tokyo Ohka Kogyo Co. Ltd.
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