Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1992-05-26
1994-01-11
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430323, 430324, 430314, 156643, 1566591, G03F 736
Patent
active
052780295
ABSTRACT:
A method for forming a resist pattern comprising applying onto a base plate a resinous composition comprising a compound capable of generating an acid when irradiated with actinic rays to obtain a photosensitive layer, exposing the thus formed layer through a pattern mask to actinic rays, applying onto the whole surface of the layer an alkoxysilane gas and subjecting the thus treated layer to dry etching to remove unexposed area of said layer. By the adoption of the present method, a very fine resist pattern which is useful for the preparation of semiconductor element, magnetic bubble memory element and the like, can be easily and economically prepared.
REFERENCES:
patent: 4552833 (1985-11-01), Ito et al.
patent: 4751170 (1988-06-01), Mimura et al.
patent: 4782008 (1988-11-01), Babich et al.
Nishijima Kanji
Shirai Masamitsu
Tsunooka Masahiro
Dote Janis L.
McCamish Marion E.
Nippon Paint Co. Ltd.
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