Method for forming a micro pattern, micro pattern, method...

Details Method for forming a micro pattern, micro pattern, method... Method for forming a micro pattern, micro pattern, method...

2007-06-12

2007-06-12

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S324000, C430S330000

Reexamination Certificate

active

10901078

ABSTRACT:
An organic monomolecular film is formed on a first substrate, and micro processed using photolithography technique to form an organic monomolecular film pattern. Then, a thin film is selectively grown on the organic monomolecular film pattern, and transcribed onto a second substrate to form a micro pattern made of the thin film on the second substrate.

REFERENCES:
patent: 5358604 (1994-10-01), Lin et al.
patent: 2002/0171026 (2002-11-01), Kuroda
patent: 2005/0074898 (2005-04-01), Datwani et al.
Lingjie Guo et al.; “Nanoscale silicon field effect transistors fabricated using imprint lithography”; Appl Phys. Lett; vol. 71 (No. 13), Sep. 29, 1997 pp. 1881-1883.

Affiliated with

Also associated with

Rating

Method for forming a micro pattern, micro pattern, method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a micro pattern, micro pattern, method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a micro pattern, micro pattern, method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3860912