Method for forming a metal oxide film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

Reexamination Certificate

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C438S680000, C257SE21010

Reexamination Certificate

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10808193

ABSTRACT:
A method for forming a capacitor insulation film includes the step of depositing a monoatomic film made of a metal by supplying a metal source including the metal and no oxygen, and depositing a metal oxide film including the metal by using a CVD technique. The method provides the metal oxide film having higher film properties with a higher throughput.

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Chinese Office Action, dated Mar. 9, 2007 for corresponding Chinese Patent Application 2004100313924.

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