Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Physical stress responsive
Reexamination Certificate
2008-03-07
2010-02-23
Zarneke, David A (Department: 2891)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Physical stress responsive
C438S051000, C438S052000, C438S053000, C257SE29325
Reexamination Certificate
active
07666700
ABSTRACT:
The present invention is an etching mask used for fabricating of the MEMS resonator including an oscillator which both edges are fixed to a base substance and vibrates to a vibrating direction, and an electrode which is fixed to a base substance by vibration is impossible in parallel for the oscillator, and is placed every one or more at the both sides of the oscillator. The etching mask includes a mask pattern36for oscillators which covers an oscillator formation scheduled region34on a conductive film30formed all over a sacrificial film which covers a region of the principal surface except both edges of the oscillator, and a mask pattern40for electrodes which covers an electrode formation scheduled region38on a conductive film. The width about a vibrating direction of a mask pattern for oscillators and a mask pattern for electrodes is made the same, and a gap between a mask pattern for oscillators and a mask pattern for electrodes and a gap between adjoining mask patterns for electrodes are made the same.
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Oki Semiconductor Co., Ltd.
Volentine & Whitt P.L.L.C.
Zarneke David A
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