Method for fabricating source/drain devices

Details Method for fabricating source/drain devices Method for fabricating source/drain devices

2002-12-11

2004-03-30

Niebling, John F. (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S224000, C438S227000

Reexamination Certificate

active

06713338

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The invention relates to a semiconductor process, and more particularly to a source/drain (S/D) device fabricated process used in a high voltage circuit element.
2. Description of the Related Art
FIGS. 1
a
to
1
i
are cross-sections of the conventional method for fabricating S/D device.
In
FIG. 1
a
, a semiconductor substrate
101
, such as silicon, is provided, and a first isolating area
105
a
and a second isolating area
105
b
are formed thereon. A pad layer
102
, such as oxide, a conductive layer
103
, such as poly, and a first patterned photo resist layer
104
are sequentially formed in the area between the first isolating area
105
a
and the second isolating area
105
b
. The area surrounding the isolating area areas is an active area (AA).
In
FIG. 1
b
, after the conductive layer
103
is etched using the first patterned photo resist layer
104
as a mask to form a gate
103
a
, the first patterned photo resist layer
104
is removed. Then, the area of the semiconductor substrate
101
between the gate
103
a
and the first isolating area
105
a
is doped to form a lightly doped area
106
.
In
FIG. 1
c
, an isolating layer
107
, such as nitride, is conformably formed on the surface of the pad layer
102
and the gate
103
a.
In
FIG. 1
d
, the isolating layer
107
is isotropically etched to form a spacer
107
a
on the sidewall of the gate
103
a.
In
FIG. 1
e
, a second patterned photo resist layer
108
having a first opening
109
a
and a second opening
109
b
is formed on the semiconductor substrate
110
. The first opening
109
a
is positioned in the area between the gate
103
a
and the first isolating area
105
a
, and the second opening
109
b
is positioned in the area between the gate
103
a
and the second isolating area
105
b.
First ion implantation is performed on the semiconductor substrate
101
using the second patterned photo resist layer
108
as a mask with As or B ions.
FIG. 2
is a top view of
FIG. 1
e
. In
FIG. 2
, part of the active area and half the width of the gate
103
a
are exposed by the first opening
109
a
in the second patterned photo resist layer
108
.
In
FIG. 1
f
, a first doped area
110
a
is formed at the bottom of the first opening
109
a
and a second doped area
110
b
is formed at the bottom of the second opening
109
b
. After the first ion implantation, the second patterned photo resist layer
108
is removed.
In
FIG. 1
g
, a third patterned photo resist layer
111
having a third opening
112
is formed on the semiconductor substrate
101
, and half the width of the gate
103
a
is exposed by the third opening
112
in the third patterned photo resist layer
111
. The third opening
112
is positioned in the area between the gate
103
a
and the second isolating area
105
b.
Second ion implantation is performed on the semiconductor substrate
101
using the third patterned photo resist layer
111
as a mask and the semiconductor substrate
101
is annealed with As or B ions.
FIG. 3
is a top view of
FIG. 1
f
. In
FIG. 3
, part of the active area and half the width of the gate
103
a
are exposed by the first opening
112
in the third patterned photo resist layer
111
, and the area between the gate
103
a
and the first isolating
105
a
is covered with the third patterned photo resist layer
111
.
In
FIG. 1
h
, a deeply doped area
113
is formed at the bottom of the third opening
112
. After the second ion implantation, the third patterned photo resist layer
111
is removed. The deeply doped area
113
is 6-7 times the depth of the first doped area
110
a
and the second doped area lob. The deeply doped area
113
expands after annealing, such that the depth and the width of the deeply doped area
113
are both increased. When the deeply doped area
113
increases, the concentration of dopant inside the deeply doped area
113
decreases and the breakdown voltage of the deeply doped area
113
increases accordingly.
By varying the energy of the ions to form the deeply doped area
113
in the semiconductor substrate
101
, implantation depth into the substrate can be controlled. Meanwhile, the ions also penetrate the gate
103
a
and the spacer
107
a
into the semiconductor substrate
101
, and the size increases after annealing.
The channel between the S/D consisting of the first doped area
110
a
and another S/D consisting of the second doped area
110
b
and deeply doped area
113
is decreased, resulting in Short Channel Effect. When the two S/D devices are both deeply doped areas, the channel between the S/D devices below the gate
103
a
and spacer
107
a
punches through, such that electrons are injected into the channel from source region before applying a gate voltage.
SUMMARY OF THE INVENTION
The present invention is directed to a method for fabricating source/drain devices in a high voltage circuit element without additional process.
Accordingly, the present invention provides a method for fabricating a source/drain device, in which, first, a semiconductor substrate having a gate is provided. A first doped area is positioned on a first side of the gate on the semiconductor substrate, and a second doped area is positioned on a second side of the gate on the semiconductor substrate with spaces between. A patterned photo resist layer having an opening on the second side of the gate is formed on the semiconductor substrate, and the exposed gate is less than half the width of the gate. The semiconductor substrate is implanted and annealed to form a dual diffusion area on the second side of the gate using the patterned photo resist layer as a mask.
Accordingly, the present invention also provides a method for fabricating source/drain devices. A silicon substrate having a gate is provided. A first doped area is positioned on a first side of the gate on the silicon substrate, and a second doped area is positioned on a second side of the gate on the silicon substrate with spaces between. A patterned photo resist layer having an opening on the second side of the gate is formed on the semiconductor substrate, and the width of the exposed gate is 2 &mgr;m. The silicon substrate is implanted and annealed to form a dual diffusion area on the second side of the gate using the patterned photo resist layer as a mask.
Accordingly, the present invention also provides a method for fabricating a source/drain device. A semiconductor substrate having a pad layer, a gate, a first isolating area and a second isolating area, is provided. The first isolating area is positioned on a first side of the gate and the second isolating area is positioned on a second side of the gate. The gate has a spacer on the sidewall of the gate. A first patterned photo resist layer is formed as a mask to implant into the semiconductor substrate to form a first doped area and a second doped area. The first doped area is positioned between the gate and the first isolating area, and the second doped area is positioned between the gate and second isolating area. A second patterned photo resist layer having an opening on the second side between the gate and the second isolating area is formed on the semiconductor substrate. The exposed gate is less than half the width of the gate. The semiconductor substrate is implanted and annealed using the patterned photo resist layer as a mask to form a dual diffusion area on the second side of the gate. The second patterned photo resist layer is removed.
Accordingly, the present invention also provides a method for fabricating a source/drain device. A silicon substrate having a pad oxide layer, a gate, a first isolating area positioned on a first side of the gate and a second isolating area positioned on a second side of the gate is provided. The gate has a spacer on the sidewall of the gate. A first patterned photo resist layer is formed as a mask to implant the silicon substrate to form a first doped area and a second doped area. The first doped area is positioned between the gate and the first isolating area, and the second doped area

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