Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Reexamination Certificate
2005-09-27
2005-09-27
Lebentritt, Michael (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
C438S592000, C438S653000
Reexamination Certificate
active
06949471
ABSTRACT:
A method of fabricating polysilicon patterns. The method includes depositing polysilicon on a substrate. The polysilicon may be doped or pre-doped depending upon the application. A mask layer is applied and patterned. Thereafter, the polysilicon is etched to form the polysilicon patterns and an oxidizing step is performed. The mask layer is removed after the oxidizing step is performed.
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Chi Min-Hwa
Hao Ching-Chen
Lin Hung-Jen
Shen Chih-Heng
Lebentritt Michael
Luk Olivia T
Slater & Matsil L.L.P.
Taiwan Semiconductor Manufacturing Company , Ltd.
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