Method for fabricating optical interference display cell

Details Method for fabricating optical interference display cell Method for fabricating optical interference display cell

2006-07-18

2006-07-18

Norton, Nadine G. (Department: 1765)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S396000, C438S030000, C438S157000, C438S099000, C216S002000, C216S005000, C216S013000, C216S017000, C216S023000, C216S024000, C216S067000, C359S245000, C359S246000, C359S254000, C359S290000, C359S291000

Reexamination Certificate

active

07078293

ABSTRACT:
A method for fabricating an optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.

REFERENCES:
patent: 5835255 (1998-11-01), Miles
patent: 6870654 (2005-03-01), Lin et al.
patent: 2004102022 (2004-04-01), None

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