Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1995-07-06
1998-06-09
Chaudhari, Chandra
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438286, 438954, H01L 218247
Patent
active
057633088
ABSTRACT:
A flash memory cell, comprising: a composite insulating film formed on a substrate at a predetermined size which charges are trapped or detrapped; a drain formed at one side of the composite insulating film; a source formed a predetermined distance away the other side of the composite insulating film; a program/erasure gate formed on the composite insulating film; an interlayer insulating film for covering the drain, the source and the program/erasure gate; a selecting gate formed on the interlayer insulating film, which is programmable and erasable at low voltages and operable by application of a single power system. In the cell, the low voltages allow peripheral circuit to be designed easily and the chip size to be reduced. Further, the repeating number of the programming and erasing can be markedly increased since the flash memory cell employs a channel erasure manner as well as low powers. It is preventive of overerasure and thus can erase information more quickly. Furthermore, the flash memory cell is relatively even in topology, to which processing difficulty is low owing.
REFERENCES:
patent: 4780424 (1988-10-01), Holler et al.
patent: 4795719 (1989-01-01), Eitan
patent: 4852062 (1989-07-01), Baker et al.
patent: 5219773 (1993-06-01), Dunn
patent: 5324675 (1994-06-01), Hayabuchi
patent: 5489542 (1996-02-01), Iwai et al.
Chaudhari Chandra
Hyundai Electronics Industries Co,. Ltd.
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