Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-11-21
2009-06-23
Lindsay, Jr., Walter L (Department: 2812)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S478000, C438S514000, C438S758000, C257SE21055, C257SE21057, C257SE21634
Reexamination Certificate
active
07550336
ABSTRACT:
A method for fabricating an NMOS transistor is disclosed. First, a substrate having a gate structure thereon is provided. A carbon implantation process is performed thereafter by implanting carbon atoms into the substrate for forming a silicon carbide region in the substrate. Subsequently, a source/drain region is formed surrounding the gate structure. By conducting a carbon implantation process into the substrate and a corresponding amorphorized implantation process before or after the carbon implantation process is completed, the present invention eliminates the need of forming a recess for accommodating an epitaxial layer composed of silicon carbide while facilitates the formation of silicon carbide from the combination of both implantation processes.
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Chen Jung-Chin
Chen Po-Yuan
Hsiao Tsai-Fu
Ahmadi Mohsen
Hsu Winston
Lindsay, Jr. Walter L
United Microelectronics Corp.
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