Semiconductor device manufacturing: process – Making passive device – Planar capacitor
Patent
1997-05-27
1999-02-16
Bowers, Charles
Semiconductor device manufacturing: process
Making passive device
Planar capacitor
438394, H01L 2120
Patent
active
058720405
ABSTRACT:
A method is provided for the manufacture of precision electronic components such as resistors, inductors, and capacitors on a polymer or ceramic surface. The electronic components can be deposited and trimmed to precise or matched values without having precise depositions of all of the pre-patterned materials. Thin film electronic components are deposited on a surface, parameter values are measured or estimated, a correction offset file is generated, and the components are trimmed using adaptive lithography to a very close tolerance. A computer program can be used to enable the adjustment of electronic components by techniques such as changing the physical length of an inductor coil or resistor lead, or by changing a capacitor plate area.
REFERENCES:
patent: 3781610 (1973-12-01), Bodway
patent: 3947934 (1976-04-01), Olson
patent: 4020222 (1977-04-01), Kausche et al.
patent: 4087778 (1978-05-01), Merz et al.
patent: 4200970 (1980-05-01), Schanberger
patent: 4388506 (1983-06-01), Geller et al.
patent: 4418474 (1983-12-01), Barnett
patent: 4470096 (1984-09-01), Guertin
patent: 4570201 (1986-02-01), Bentley
patent: 4783695 (1988-11-01), Eichelberger et al.
patent: 4801469 (1989-01-01), Norwood
patent: 5043295 (1991-08-01), Ruggerio et al.
patent: 5084420 (1992-01-01), Tsai
patent: 5266529 (1993-11-01), Lou et al.
patent: 5323138 (1994-06-01), Oki et al.
patent: 5345361 (1994-09-01), Billotte et al.
patent: 5347423 (1994-09-01), DeNeuf et al.
patent: 5353498 (1994-10-01), Fillion et al.
patent: 5358775 (1994-10-01), Horn, III
patent: 5370776 (1994-12-01), Desaigoudar et al.
patent: 5420063 (1995-05-01), Maghroudnia et al.
patent: 5420515 (1995-05-01), Uhling et al.
patent: 5450263 (1995-09-01), Desaigoudar et al.
patent: 5468672 (1995-11-01), Rosvold
patent: 5469131 (1995-11-01), Takahashi et al.
patent: 5496762 (1996-03-01), Sandhu et al.
patent: 5547896 (1996-08-01), Linn et al.
U.S. Patent application No. 08/349,228 "Thin Film Resistors on Organic Surfaces" by Robert J. Wojnarowski, et al, filed Dec. 5, 1994.
"Response Surface Methodology", by William G. Hunter, Quality Control Handbook, Section 28, pp. 28-1-28-12.
"Lightly Trimming the Hybrids" by Elshabini-Riad, et al, 1993 IEEE, Circuits and Devices, pp. 30-34.
"Electrical Trimming of Ion-Beam-Sputtered Polysilicon Resistors by High Current Pulses" by Soumen Das, et al, IEEE Transactions on Electron Devices, vol. 41, No. 8, Aug. 1994, pp. 1429-1434.
"Improvement of Laser Trimmed Laser Resistor Stability by Selection of Optimal Trim Paths" by Jaime Ramfrez-Angulo, et al, IEEE pp. 2188-2191, Apr. 1991.
"A Technology for High Density Mounting Utilitzing Polymeric Multilayer Substrate" by M. Takeuchi, et al, IEEE/CHMT 1989 Japan IEMT Symposium, pp. 136-140.
Balch Ernest Wayne
Douglas Leonard Richard
Downey Evan Taylor
Gdula Michael
Rose James Wilson
Agosti Ann M.
Bowers Charles
General Electric Company
Snyder Marvin
Thompson Craig
LandOfFree
Method for fabricating a thin film capacitor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for fabricating a thin film capacitor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating a thin film capacitor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2061996