Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-11-14
2006-11-14
Nguyen, Thanh (Department: 2813)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S381000, C438S393000
Reexamination Certificate
active
07135366
ABSTRACT:
A lateral metal-insulator-metal capacitor fabricated with consistent dummy fill and slotting patterns that assure predictable and controlled performance from the metalization layout while conforming to process design rules.
REFERENCES:
patent: 5583359 (1996-12-01), Ng et al.
patent: 6385033 (2002-05-01), Javanifard et al.
Jmaev Jack
Nguyen Thanh
LandOfFree
Method for fabricating a lateral metal-insulator-metal... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for fabricating a lateral metal-insulator-metal..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating a lateral metal-insulator-metal... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3698439