Method for examining structures on a semiconductor substrate

Details Method for examining structures on a semiconductor substrate Method for examining structures on a semiconductor substrate

2005-02-22

2005-02-22

Glick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Telescope or microscope

C378S062000

Reexamination Certificate

active

06859516

ABSTRACT:
The invention is based on a method for examining structures on a semiconductor substrate. The structures are imaged with X-radiation in an X-ray microscope. The wavelength of the X-radiation is established as a function of the thickness of the semiconductor substrate in such a way that both a suitable transmission of the X-radiation through the semiconductor substrate and a high-contrast image are obtained. As a result, the structures can be observed continuously with short exposure times, high resolution and even while they are in operation.

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Gerd Schneider,Röntgenmikroskopie mit Synchrotronstrahlung an wässrigen biologischen Systemen—experimentelle und theoretische Untersuchungen, Dissertation, zur Erlangung des Doktorgrades der Mathematisch—Naturwissenschaftlichen Fachbereiche der Georg-August-Universität zu Göttingen (1992), pp. 1-10 (US Translation of the relevant portions of the dissertation is provided).
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