Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent
1993-11-15
1999-03-09
Breneman, R. Bruce
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
438743, 438744, 438715, 438723, H01L 2100, H01L 21302
Patent
active
058800360
ABSTRACT:
A process for controlling the etch of a silicon dioxide layer at a high etch rate and high selectivity with respect to silicon nitride, particularly in a multilayer structure, by maintaining various portions of the etch chamber at elevated temperatures.
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Becker David S.
Blalock Guy T.
Breiner Lyle D.
Breneman R. Bruce
Dennison Lia
Fields Walter D.
Goudreau George
Micro)n Technology, Inc.
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