Method for elimination of TEOS/ozone silicon oxide surface sensi

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

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42725537, 438787, 438790, C23C 1640

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active

061499749

ABSTRACT:
A method and apparatus for reducing surface sensitivity of a TEOS/O.sub.3 SACVD silicon oxide layer, formed over a substrate, that deposits a ramp layer while ramping pressure to a target deposition pressure and deposits an SACVD layer over the ramp layer. In one embodiment, the flow of ozone is stopped during the pressure ramp-up to control the thickness of the ramp layer.

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